JPS6212947U - - Google Patents

Info

Publication number
JPS6212947U
JPS6212947U JP10436785U JP10436785U JPS6212947U JP S6212947 U JPS6212947 U JP S6212947U JP 10436785 U JP10436785 U JP 10436785U JP 10436785 U JP10436785 U JP 10436785U JP S6212947 U JPS6212947 U JP S6212947U
Authority
JP
Japan
Prior art keywords
heat treatment
wafer
treatment chamber
semiconductor manufacturing
model registration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10436785U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0510354Y2 (en]
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985104367U priority Critical patent/JPH0510354Y2/ja
Publication of JPS6212947U publication Critical patent/JPS6212947U/ja
Application granted granted Critical
Publication of JPH0510354Y2 publication Critical patent/JPH0510354Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP1985104367U 1985-07-08 1985-07-08 Expired - Lifetime JPH0510354Y2 (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985104367U JPH0510354Y2 (en]) 1985-07-08 1985-07-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985104367U JPH0510354Y2 (en]) 1985-07-08 1985-07-08

Publications (2)

Publication Number Publication Date
JPS6212947U true JPS6212947U (en]) 1987-01-26
JPH0510354Y2 JPH0510354Y2 (en]) 1993-03-15

Family

ID=30977798

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985104367U Expired - Lifetime JPH0510354Y2 (en]) 1985-07-08 1985-07-08

Country Status (1)

Country Link
JP (1) JPH0510354Y2 (en])

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001060565A (ja) * 1999-08-20 2001-03-06 Lintec Corp 光照射装置及びこれを用いたピックアップ装置
WO2006087777A1 (ja) * 2005-02-16 2006-08-24 Youtec Co., Ltd. 加圧式ランプアニール装置、加圧式ランプアニール処理方法、薄膜及び電子部品

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS567436A (en) * 1979-06-29 1981-01-26 Sony Corp High pressure treating device
JPS58143520A (ja) * 1982-02-22 1983-08-26 Toshiba Corp 半導体結晶の熱処理方法
JPS59178718A (ja) * 1983-03-29 1984-10-11 Sony Corp 半導体基体の処理装置
JPS60104366A (ja) * 1983-10-24 1985-06-08 Yokogawa Hewlett Packard Ltd プリンタにおけるトラクタ駆動装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS567436A (en) * 1979-06-29 1981-01-26 Sony Corp High pressure treating device
JPS58143520A (ja) * 1982-02-22 1983-08-26 Toshiba Corp 半導体結晶の熱処理方法
JPS59178718A (ja) * 1983-03-29 1984-10-11 Sony Corp 半導体基体の処理装置
JPS60104366A (ja) * 1983-10-24 1985-06-08 Yokogawa Hewlett Packard Ltd プリンタにおけるトラクタ駆動装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001060565A (ja) * 1999-08-20 2001-03-06 Lintec Corp 光照射装置及びこれを用いたピックアップ装置
WO2006087777A1 (ja) * 2005-02-16 2006-08-24 Youtec Co., Ltd. 加圧式ランプアニール装置、加圧式ランプアニール処理方法、薄膜及び電子部品
JPWO2006087777A1 (ja) * 2005-02-16 2008-08-07 株式会社ユーテック 加圧式ランプアニール装置、加圧式ランプアニール処理方法、薄膜及び電子部品

Also Published As

Publication number Publication date
JPH0510354Y2 (en]) 1993-03-15

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